Electronics and Communication Engineering - Electronic Devices and Circuits
Exercise : Electronic Devices and Circuits - Section 4
- Electronic Devices and Circuits - Section 1
- Electronic Devices and Circuits - Section 2
- Electronic Devices and Circuits - Section 3
- Electronic Devices and Circuits - Section 4
- Electronic Devices and Circuits - Section 5
- Electronic Devices and Circuits - Section 6
- Electronic Devices and Circuits - Section 7
- Electronic Devices and Circuits - Section 8
- Electronic Devices and Circuits - Section 9
- Electronic Devices and Circuits - Section 10
- Electronic Devices and Circuits - Section 11
- Electronic Devices and Circuits - Section 12
- Electronic Devices and Circuits - Section 13
- Electronic Devices and Circuits - Section 14
- Electronic Devices and Circuits - Section 15
- Electronic Devices and Circuits - Section 16
21.
Assertion (A): The forward resistance of a p-n diode is not constant.
Reason (R): The v-i characteristics of p-n diode is non-linear.
Answer: Option
Explanation:
If v-i characteristics is non linear, the ratio v-i is not constant.
22.
For a photoengraving the mask used is
Answer: Option
Explanation:
The mask that is prepared first is called the master mask made from glass substrates covered by thin chromium film.
From the master masks are prepared working masks by contact pointing and used for Photolithography which means Photo engraving.
23.
In a varactor diode the increase in width of depletion layer results in
Answer: Option
Explanation:
Capacitance is inversely proportional to distance between plates.
24.
In given figure a silicon diode is carrying a constant current of 1 mA. When the temperature of the diode is 20°C, VD is found to be 700 mV. If the temperature rises to 40°C, VD becomes approximately equal to


Answer: Option
Explanation:
Id = Io(eVD/ηVT - 1)
By considering , then
= eVD/ηVT
Id is constant according to question,
VD a T
.
25.
The work function of a photo surface whose threshold wave length is 1200 A, will be
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