IndiaBIX

Electronics and Communication Engineering - Electronic Devices and Circuits - Discussion

Discussion Forum : Electronic Devices and Circuits - Section 4 (Q.No. 46)
Electronic Devices and Circuits
46.
Consider the following statements: The function of oxide layer in an IC device is to
  1. mask against diffusion or non implant
  2. insulate the surface electrically
  3. increase the melting point of silicon
  4. produce a chemically stable protective layer
Of these statements:
1, 2, 3 are correct
1, 3, 4 are correct
2, 3, 4 are correct
1, 2, 4 are correct
Answer: Option
Explanation:

Oxide layer cannot have any effect on melting point of silicon. Moreover before melting silicon breaks down.

Discussion:
Be the first person to comment on this question !
Post your comments here:

Your comments will be displayed after verification.

Quick links
Quantitative Aptitude
Verbal (English)
Reasoning
Programming
Interview
Placement Papers