Electronics and Communication Engineering - Exam Questions Papers - Discussion

Discussion Forum : Exam Questions Papers - Exam Paper 14 (Q.No. 12)
12.
Thin gate oxide in a CMOS process in preferably grown using
wet oxidation
dry oxidation
epitaxial deposition
ion implantation
Answer: Option
Explanation:
No answer description is available. Let's discuss.
Discussion:
2 comments Page 1 of 1.

Rajashekar said:   8 years ago
Answer is B.

PRASHANT said:   7 years ago
B is correct answer because dry oxidation produces thin oxide which is for gate and wet oxidation produces fox (filed oxide) to insulate 2 active transistors.

Post your comments here:

Your comments will be displayed after verification.